Gas-discharge ion sources for generating linear ion beams. Principle of operation - anode layer ion beam source. High uniformity of ion flux distribution along the source makes it the optimum choice for substrate treatment on a drum or a carousel. A linear ion beam source with highly homogeneous ion current density across beam's width. Length of linear zone is 350 mm.
- sputtering of materials from dielectric and conductive targets;
- magnetron sputtering assistance;
- ion cleaning, etching;
- plasma-enhanced chemical vapor deposition (PECVD);
- surface modification.