Источник ионного луча IBS - 400

Gas-discharge ion sources for generating linear ion beams. Principle of operation - anode layer ion beam source. High uniformity of ion flux distribution along the source makes it the optimum choice for substrate treatment on a drum or a carousel. A linear ion beam source with highly homogeneous ion current density across beam's width. Length of linear zone is 350 mm. 

Processes:

• sputtering of materials from dielectric and conductive targets;


• magnetron sputtering assistance;


• ion cleaning, etching;


• polishing;


• plasma-enhanced chemical vapor deposition (PECVD);


• surface modification.