10kW 20kW High Power Impulse Magnetron Sputtering HIPIMS Power Supply Unit for Vacuum Coating System

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Product Overview


High Power Impulse Magnetron Sputtering HIPIMS Power Supply Unit for Vacuum Coating System


High Ionization Magnetron Power Supply has coupled high power pulse into DC magnetron sputtering. It delivers not only stable DC magnetron sputtering  but also short high power pulse into cathode and plasma. The pulses are of >400A at voltage of 1kV with short duration and low frequency to keep low average output power down to the range of kW while the pulse peak power can be upto the range of MW.


Due to high peak power, the plasma density during the pulses is extremely high that gives very high ionization fraction compared to DC magnetron plasmas as well as it allows for fine control of the sputtered species during deposition.


Advanced Features

High peak power output
High ionization fraction of upto 50%
Effective utilization of cathode/target
Easily adaptable to existing cathode and process
Active arc suppression with stable sputtering process
Adjustable pulse duration and frequency
Good stoichiometric film in reactive deposition
Minimum film defect by droplet - free sputtering
Superior film density and extreme structural conformity
Excellent adhesion and decreased roughness


Technical Specifications of the HIPIMS Power Supply:


Average Power5kW, 10kW, 15kW, 20kW
DC Voltage>700V
DC Current5A - 30A
Pulse Voltage200V - 1000V
Pulse Current<=400A
Pulse Width30us - 300us
Pulse Frequency30Hz - 300Hz
Input Power3-phase 380V+/-5%, 50/60Hz



Packaging & Shipping


Packing, Shipping & Logistics details:


1. Outside package: Standard marine export polywood case.
2. Inner package: Stretchy film and plastic film for humidity.

3. Wooden box at the bottom of a solid iron socket for easy handling
4. We can package according to your requests.



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0.0799 s.