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Exposure machine model | ADI-ST-650 | |
Table type | Single table | |
Loading and unloading methods | Manual | |
Maximum substrate size | 635mm×820mm | |
Maximum exposure size | 630mm×810mm | |
Minimum substrate size | 200mm×170mm | |
Substrate thickness | 0.075mm-5.0mm | Expandable to 8.0mm |
Minimum resolution | 35um / 35um | Development analysis |
Process analysis | ≥50um * | More than 2.5mil is recommended for mass production |
Depth of field | ±300um | |
Line width tolerance | ±10% | |
Alignment accuracy | ±12um | |
Inter layer alignment accuracy | 24um | |
Number of shots | 6 | |
Laser wave length | 405nm±5nm | |
Laser power | 30W | |
Exposure energy adjustment range | 5~2000mj | |
Energy uniformity | ≥95% | |
Contraposition mode | Four point alignment and multi-point alignment | |
Grasping mode | Target, through hole, blind hole, etc | |
Data input | Gerber274D/X,ODB++ | |
Expansion and contraction function | Automatic expansion and contraction, fixed expansion and contraction, measurement expansion and contraction, segmented expansion and contraction | |
Capacity 620mm×510mm | 10 sec / face @35mj & 3mill / S | Excluding up and down board time |
20 sec / face @100mj & 3mill / S | ||
MES system | Configure MES network port | Cooperative development |
Data one click import function | have | |
Safeguard | Emergency stop switch | |
Overall dimension | L2600mm×W1750mm×H1970mm | |
Weight | About 4000kg |





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