RF Power Supply Non Conductive Film Magnetron Sputtering Coater

Share on (1600515515768):


Price:US$30,000.00 - US$45,000.00

Quantity:


Product Overview

Description


RF Power Supply Non-Conductive Film Magnetron Sputtering Coater



Product Description


CY-MSP325S-DCRF is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material. This coating system is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc..


 


Technical Parameter



















































































































Input Power



1.220VAC 50/60Hz, single phase
2.2000W  (including pump)



Source Power



1.Two sputtering power sources are integrated into one control box



2. DC source: 500W for coating metallic materials



3.RF source: 500W with automatching for coating non-metallic materials 



4.Compact 300 RF source is available at extra cost



Magnetron 


Sputtering  


Head



1.Two 2" Magnetron Sputtering  Heads with water cooling jackets are included  
 One is connected to RF power supply for no-conductive materials  
 Another is connected to DC sputtering power source for coating metallic materials



2.Target size requirement: 2" diameter



3.Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets



4.One stainless steel and one Al2O3 ceramic targets are included for demo testing



5. Head Water Cooling: 10ml/min water flow required, and one 16ml/min digitally controlled 


recirculating water chiller is included for cooling both magnetron sputtering heads



6. Customized coater: Two DC head without RF sputtering,  RF head without DC 


Sputering, 3 heads (3 DC/ 2DC+1RF/ 3RF) are available upon request.



Vacuum 


Chamber



1.Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel



2.Observation Window:  100 mm diameter



Sample Holder



1.Sample holder size: 140mm dia. for. 4" wafer max



2.Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating



3.The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C



Gas Flow 


Control



1.Flow rate:  200 ml/min max.



2.Flow rate is adjustable on the 6" touch screen control panel



Vacuum Pump 


Station



High speed turbo vacuum pump system is directly installed on the vacuum chamber
 for max. vacuum level 



Heavy duty dual stage mechanical pump is connected to turbo pump for faster 


pump speed



Mobile pump station is included and the compact sputtering coater can be put on 


top of station



Max. vacuum level: 10^-6 torr with chamber baking     



Thickness 


Monitor



One Precision quartz thickness sensor is built into the chamber to monitor coating 
 thickness with accuracy 0.10 Å  



LED Display Unit outside chamber can:



Input material to be coated according to data base included



Display total thickness coated and coating speed



 5 pcs quartz sensors (consumable) are included 



Water cooling is required



Water Chiller



One digital temperature controlled recirculating water chiller is included. 


Refrigeration range: 5~35 °C


Flow rate: 16 L/min


Pump pressure: 14 psi



Overall 


Dimensions



L6600mm× W660mm× H1200mm



Net Weight



160 kg



Warranty



One years limited warranty with lifetime support




 


 


 


 


4.jpg3.jpg2.jpg1.jpg





Packaging & Shipping


Plastic paper inside, polyfoam filled, wooden box outside or as your requirement.


Magnetron Sputter Coater with Molecular Pump System for Non-Conductive Film on Substrate
Shipping and transportation as customer request. Generally, our mode of transport are by sea, by air or rail transport.


Magnetron Sputter Coater with Molecular Pump System for Non-Conductive Film on Substrate





Our Services


1. Reply your inquiry in 24 working hours.
2. Experienced staffs answer all your questions in fluent English.
3. Customized design is available.
4. Exclusive and unique solution can be provided to our customer by our well-trained and professional engineers and staff.
5. Professional factory : We are manufacturer, specializing in laboratory equipment.


 





Company Information


Zhengzhou TAINUO Film Materials Co., Ltd. is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches.  Our main products include: PVD magnetron sputtering coater, plasma sputtering coater, evaporating coater, spin coater, dip coater, tape casting coater, plasma cleaner, metallographic cutter, lapping and polishing machine, dental furnace, CVD tube furnace system, electrospinning system and so on.


Partial Company Products


1111.jpg 


 





Contact Information


Please do not hesitate to make an inquiry to us !


me.png 




0.3394 s.