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CY-MSP325S-DCRF is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material. This coating system is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc..
Technical Parameter
Input Power | 1.220VAC 50/60Hz, single phase |
Source Power | 1.Two sputtering power sources are integrated into one control box |
2. DC source: 500W for coating metallic materials | |
3.RF source: 500W with automatching for coating non-metallic materials | |
4.Compact 300 RF source is available at extra cost | |
Magnetron Sputtering Head | 1.Two 2" Magnetron Sputtering Heads with water cooling jackets are included |
2.Target size requirement: 2" diameter | |
3.Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets | |
4.One stainless steel and one Al2O3 ceramic targets are included for demo testing | |
5. Head Water Cooling: 10ml/min water flow required, and one 16ml/min digitally controlled recirculating water chiller is included for cooling both magnetron sputtering heads | |
6. Customized coater: Two DC head without RF sputtering, RF head without DC Sputering, 3 heads (3 DC/ 2DC+1RF/ 3RF) are available upon request. | |
Vacuum Chamber | 1.Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel |
2.Observation Window: 100 mm diameter | |
Sample Holder | 1.Sample holder size: 140mm dia. for. 4" wafer max |
2.Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating | |
3.The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C | |
Gas Flow Control | 1.Flow rate: 200 ml/min max. |
2.Flow rate is adjustable on the 6" touch screen control panel | |
Vacuum Pump Station | High speed turbo vacuum pump system is directly installed on the vacuum chamber |
Heavy duty dual stage mechanical pump is connected to turbo pump for faster pump speed | |
Mobile pump station is included and the compact sputtering coater can be put on top of station | |
Max. vacuum level: 10^-6 torr with chamber baking | |
Thickness Monitor | One Precision quartz thickness sensor is built into the chamber to monitor coating |
LED Display Unit outside chamber can: | |
Input material to be coated according to data base included | |
Display total thickness coated and coating speed | |
5 pcs quartz sensors (consumable) are included | |
Water cooling is required | |
Water Chiller | One digital temperature controlled recirculating water chiller is included. Refrigeration range: 5~35 °C Flow rate: 16 L/min Pump pressure: 14 psi |
Overall Dimensions | L6600mm× W660mm× H1200mm |
Net Weight | 160 kg |
Warranty | One years limited warranty with lifetime support |




Plastic paper inside, polyfoam filled, wooden box outside or as your requirement.

Shipping and transportation as customer request. Generally, our mode of transport are by sea, by air or rail transport.

1. Reply your inquiry in 24 working hours.
2. Experienced staffs answer all your questions in fluent English.
3. Customized design is available.
4. Exclusive and unique solution can be provided to our customer by our well-trained and professional engineers and staff.
5. Professional factory : We are manufacturer, specializing in laboratory equipment.
Zhengzhou TAINUO Film Materials Co., Ltd. is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Our main products include: PVD magnetron sputtering coater, plasma sputtering coater, evaporating coater, spin coater, dip coater, tape casting coater, plasma cleaner, metallographic cutter, lapping and polishing machine, dental furnace, CVD tube furnace system, electrospinning system and so on.
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