High Purity 99.95% Metal Chromium Pellets Cr Chromium Granules for semi conductor Experiments

Product Overview

Description

Hot Sale High Purity 99.95% Metal Chromium Pellets Cr Chromium Granules for semi conductor Experiments

Name	Metal Chromium Pellets
Purity	99.9%-99.95%
Size	1-10mm,10x10x10mm,D3x3mm, D6x6mm,2inch,3inch, As request
Symbol	Cr
Density	7.19g/cm³
Melting Point	1857℃
Shape	Planar target, Rotary target.Pellets, Piece,
MOQ	1KGS
Application	Experiments materials,Evaporation materials, PVD Film Coating and etc

Chromium pellets has the same properties as metal chromium (Cr),Chromium is a chemical element with the symbol Cr and atomic number 24, it is a steely-grey, lustrous, hard and brittle transition metal. Chromium is also the main additive in stainless steel, to which it adds anti-corrosive properties. Chromium sputtering targets and chromium cathodes are usually used for decorative coating and tool coating.

When chromium target is used for depositing a decorative coating, chromium thin film can make an attractive sheen on watches, electronic goods, operating elements on appliances and a range of other products . Decorative chromium coatings are applied by the magnetron sputtering method. Wear resistant and adhesive layers can also be produced by the arc evaporation method.

The hard material coatings chromium (Cr) and chromium nitride (CrN) optimally protect engine components such as piston rings,to against premature wear and consequently extend the useful life of important engine parts. Chromium is also used as a bonding layer for DLC coatings (Diamond Like Carbon), for example on bucket tappets.

 

 

The microstructure can be adjusted by our flexibility production process, to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The pictures below are two micrographs of our chromium sputtering target, the average grain size<100μm.

Our chromium sputtering target is high purity, the most important benefit is that the films will possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Following is a typically Certificate of analysis for 3N5 chromium sputtering target.

Analytical Methods:
1. Metallic elements were analyzed by GDMS and ICP-OES.
2. Gas elements were analyzed by LECO.

Application: Chromium Sputtering Targets

Other Related Sputtering Targets

Metal Target	Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and rare earth targets
Alloy Target	Ni,Fe,Co,Cu,Al alloy. and special alloy
Evaporation Materials	Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and etc
Ceramic Targets	Oxide Ceramic, Compound ceramic targets.