Tantalum Target / Tantalum Sputtering Target
- Category: >>>
- Supplier: Chengdu Haoxuan Technology Co. Ltd.
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Product Overview
Description
Chemical Content: Ta: 99.9%-99.99%min
Grade | Ta 3N | Ta 3N5 | Ta 4N |
Purity(%min) | 99.9 | 99.95 | 99.99 |
Al(ppm max) | 20 | 5 | 5 |
Cr(ppm max) | 50 | 20 | 15 |
Fe(ppm max) | 50 | 30 | 25 |
Mn(ppm max) | 10 | 5 | 5 |
Mo(ppm max) | 30 | 5 | 5 |
Nb(ppm max | 100 | 20 | 15 |
Ni(ppm max) | 50 | 20 | 15 |
Si(ppm max) | 100 | 20 | 15 |
Ti(ppm max | 10 | 5 | 5 |
W(ppm max) | 30 | 20 | 15 |
Applications: Used for electronic industry, atomic energy industry etc., scientific research, experimentation and development.
Packing: Outer containers, inner vacuum bag.(according to the request of customers.)
Product picture:
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