Indium Tin Oxide (ITO) Glass Magnetron Sputtering Coating Line

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Product Overview

Description


Indium Tin Oxide (ITO) magnetron sputtering coating line


 


ITO (Indium Tin Oxides) as nano-indium tin metal oxide, has good electrical conductivity and transparency, can cut off harmful to the human body electron radiation, ultraviolet and far infrared. Therefore, after spraying on glass, plastic and electronic display screen, in the enhanced conductivity and transparency at the same time cut off the harmful electronic radiation and ultraviolet, infrared. The coating equipment is in the high-quality float glass using vacuum magnetron sputtering technology, twin cathode, IF sputtering technology, and with the international advanced control system, plating SO2 / ITO film, the production process all automatic, continuous The
Technical characteristics of ITO film coating production line
1) Vacuum chamber material using SUS304, vacuum chamber wall for polishing, the outer wall after polishing with beads treatment.
2) between the vacuum chamber with independent door valve - flap valve separated, you can achieve effective partition, stabilize the process gas. At present, our company uses the flap valve design, it is more than the current domestic common flap valve seal better and more durable.
3) transmission using magnetic guidance, to ensure the stability of transmission. The entire production line of the speed of each section using frequency control motor drive, running speed can be adjusted.
4) electrical control system: touch screen and P L C automatic control, man-machine dialogue mode to achieve the system data display, operation and control technical parameters
1) Ultimate vacuum pressure: 6 × 1 0E-4 Pa
2) the average production cycle: according to product identification
3) Substrate size: can be customized according to requirements
4) Film uniformity: ± 3% Advanced mobile magnetic field technology greatly improved target utilization
Segmented heating design, is conducive to process optimization. Products are widely used in liquid crystal display (LCD), touch screen, solar cells, microelectronics ITO conductive film glass, optoelectronics and a variety of optical fields



Sputtering line


Structure of the magnetron sputtering coating line


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The vacuum coating production line is usually connected by more than three vacuum chambers to form a continuous working vacuum coating machine.



  • Advantages of this vacuum coating line are:

  • Extremely high vacuum, high film quality

  • Coating film quality is stable

  • High productivity

  • High degree of automation, fewer operator requirements


The vacuum coating line is mainly used for film coating on flat glass, acrylic, PC, PET substrates, various metal films, dielectric films, dielectric metal composite films, transparent conductive films and other film applications.
The industries involved in the vacuum coating line include the surface coating of plastic panels and display screens in mobile phones, electronics, home appliances and other industries.


The vacuum coating production line adopts molecular pump or diffusion pump to form advanced design with atmosphere isolation. The equipment uses turbo floating molecular pump to obtain high efficiency isolation, stable pumping speed and uniform gas distribution. In the case of pumping with a diffusion pump, the vacuum pumping rate is high and the equipment production cost is lower.


 


Vertical magnetron sputtering coating line


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A normally complete continuous magnetron sputtering production line has a total of fifteen vacuum chambers, one for the chamber, one for the unload chamber, one for the buffer chamber, one for the unload buffer, one for the transfer chamber, and one for the unload chamber. Two transfer chambers; seven sputter coating chambers; four sputtering chambers can be installed at the same time in each sputter coating chamber; the high vacuum chamber is separated by a plug-in valve, and multi-function coating can be achieved by changing the atmosphere isolation effect; substrate rack operation The track uses a magnetic guided drive; the device is equipped with a turbo-buoy molecular pump and a mechanical pump for stable pumping speed and uniform gas distribution.


 


Horizontal magnetron sputtering coating line


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The company can provide design according to user requirements, provide a full set of equipment, responsible for the process, according to "turnkey" engineering services.


 


Magnetron sputtering cathodes


 


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Accorinf to different technical requirements of each customers, we can design different types of magnetron sputtering cathodes for the machine. This is the coating system of the machine. You can load different raw material to the cathodes for different coatings.


 


Technical Spcifications


 







































































Chamber typeVertical and horizontal method of multi-chamber
Applied materialGlass and Wafer, other plastic, metal materials
Substrate sizeVertical type2,200mm x 2,500mm
Horizontal type1,500mm x 1,800mm
Tact time60 sec or less (Static method) 35 sec or less (Dynamic method)
Coating sourceSputter sourceRotary cathode, Planar cathode
Thermal sourceCrucible, E-beam
Coating materialMetal materialAl, Ti, Cr, Cu, NiCr, Ni, Ag, other metal material
Reactive materialTiO2, Nb2O5, SiO2, TIO, SiAlOx, MoOx, other nitride / oxide material
Power supplyDC, Pulse DC, MF
Thickness uniformity±10% or less (Static film) ±5% or less (Moving film)
Measuring instrumentSheet resistance, optic (Transmittance, reflectance, color-difference meter),
plasma emission monitor, RGA
Household appliances fieldDecorative coating on household products and exterior of mobile devices
Energy fieldArchitectural window glass, solar cell
Other industrial fieldMetal thin film and oxide thin film, multi-layered thin film coating based application field

 


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Company Information


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