Laboratory muffle furnace for semiconductor scientific laboratory equipment manufacturers
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- Supplier: Zhengzhou Kejia Furnace Co. Ltd.
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Product Overview
Description
CVD semiconductor furnace equipment CVD graphene furnace
KJ-1200CVD system is a special RTP tube CVD system designed for laboratory graphene growthing,
coating thin film on the metal foil, especially for preparing flexible electrode on metallic foil on new
generation energy research. Fast heating and cooling can be achieved by sliding the furnace.
Features of semiconductor furnace equipment:
1.Dual quartz tube:100mm dia. outside tube and suspended by 80 mm diameter tube inside.
Metallic foil will be wrapped around interior tube surface for CVD reaction.
Vacuum sealed flanges for dual tube, which allow reactive gas to go through between two tubes
( 10mm space ) for reaction, and inert gas to go through center tube for cooling.
2 gas channels controlled by 2 separate digital MFC's
High speed mechanical vacuum pump is included with KF25 adapter and pipe
Sliding rail is installed on the bottom of furnace, which allows for fast heating or cooling
by sliding furnace from one side to the other side.
Technical Parameters of semiconductor furnace equipment:
Model | KJ-O1200-40-IC |
Furnace structure | High purity Al2O3 insulation chamber guarantees excellent temperature uniformity. Cooling fans are installed at the bottom of the furnace to ensure efficient ventilation. Sliding flange assembly are made of stainless steel. |
Power | 5KW |
Working voltage | 208-240VAC, 50/60Hz( According to your requirements) |
Working Temp. | ≤1150℃ |
Continuous Working Temp. | 1000℃ |
Tube material | High purity quartz tube |
Tube diameter | Outer tube diameter:40 mm |
Heating zone length | 400mm |
Constant temperature zone | 200mm |
Tube total length | 1400mm |
Accuracy | +/- 1℃ |
Temperature Control | Touch screen PID Control multi steps programmable |
Heating Rate | ≤30℃/min |
Mass Flow meters
| Three precision mass flow meters (0.02% accuracy) with digital display are installed on the bottom case to control gas flow rate automatically. MFC 1: Gas flow range from 0~100 sccm MFC 2 : Control range from 0~200 sccm MFC 3 : Control range from 0~500 sccm Flowing rate accuracy: ±1% FS Each gas channel has a SS needle valve for easy on/off The flow rate is adjustable from the MFC panel |
Rotary pump and valve
| .Pumping rate: 8m3/h 50Hz; 9.6m3/h 60Hz. Vacuum degree:10Pa KFD25 adapter and stainless steel pipe are connected between pump and tube flange with precision ball valve
|
Zhengzhou Kejia Furnace Co., Ltd. is one high-tech enterprises specialized in development, production and sales of heating treatment product.
Our products cover muffle furnace, tube furnace, vacuum furnace, atmosphere furnace, CVD system,
dental furnace, bottom lift furnace, , track furnace and others, which is widely used in metallurgy,
vacuum brazing, sintering ceramics, battery materials dry, shiny metal processing, parts annealing,
science and many other different fields.
FAQ
1. Are you a manufacturer or trade company ?
Yes,you can assured that we are a producer with full experience doing business
in domestic and oversea.
2. We are not professional for operation and installation of your machine?
While it is not a stumbling block,our machine is easy to operate,no need to professional
training,and the instruction manual and vedio sent to you are enough.What’s more,we
have professional engineers and they can solve all questions.
3. How about packaging ?………….if machine damaged,what should I do ?
Usually machine is packed with wooden case and standard export carton,plywood
carton or as your requirement.Damage haven’t happened before,if happen,we will
arrange replacement.
4. We haven’t do business before,how can I trust your company and machine ?
We have been GOLD supplier for three years with no complaints on Alibaba.and
our machine have exported to Eath Asia,South Asia,the middle East Asia,Africa etc.
areas and have a good feedback.
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