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Melting point: 1064.18 °C
Boiling point: 2856 °C.
Density: 19.32g/cm3
Color: golden yellow
Material: Au
Purity: 99.99%
Ready for magnetron sputtering coater and plasma sputtering coater
Specification | Size: 2" dia.* 0.12mm, 4N, size can be customized |
Purpose | Sputter coating, electronic technology, aerospace technology, communications technology, chemical technology, medical technology and other fields |
Applicable equipment | Sputtering equipment, SEM electron microscope equipment |
Packaging | Vacuum Packaging |
Product advantages | 1. High purity 2. Size can be customized, adapt to multiple sputtering systems 3. Film formation effect gives good density and excellent film performance 4. Short delivery period 5. Can provide recycling and reprocessing services to improve utilization |
Plastic paper inside, polyfoam filled, wooden box outside or as your requirement.

Shipping and transportation as customer request. Generally, our mode of transport are by sea, by air or rail transport.
1. Reply your inquiry in 24 working hours.
2. Experienced staffs answer all your questions in fluent English.
3. Customized design is available.
4. Exclusive and unique solution can be provided to our customer by our well-trained and professional engineers and staff.
5. Professional factory : We are manufacturer, specializing in laboratory equipment.
Zhengzhou TAINUO Film Materials Co., Ltd. is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Our main products include: PVD magnetron sputtering coater, plasma sputtering coater, evaporating coater, spin coater, dip coater, tape casting coater, plasma cleaner, metallographic cutter, lapping and polishing machine, dental furnace, CVD tube furnace system, electrospinning system and so on.
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