For semiconductor device fabrication Mixture Gases 99.9999% TMB MMS SiH4 GeH4 B2H6 With H2 N2 He And Ar
It is used in the process of semiconductor device fabrication, such as epitaxy, chemical vapor deposition, ion implantation and the like.
Product Spec
Name
Purity (%)
Balance
Filling Pressure (MPa)
Capacity (L)
Valve Type
SiH4
0.5-50
Ar,N2,He,H2
5-12
4-47
Available upon request
TMB
5ppm-23
Ar,N2,He,H2
5-12
0.7-17
B2H6
5ppm-10
Ar,N2,He,H2
5-10
4-17
MMS
5ppm-5
Ar,N2,He,H2
5-12
0.7-17
GeH4
5ppm-0.5
Ar,N2,He,H2
≥5
0.2-17
Packing & Delivery
Package: 2-40 (L) in cylinder.
Other inorganic high-purity gases are available, such as nitric oxide, nitrogen dioxide, nitrous oxide, oxysulfide.
FAQ
Why Choose Us
Our Company
Air Gas Electronic Materials Enterprise Co., Ltd is a manufacturer. Our head office was located in Taiwan. With over 20 years experience in the supply of industrial and specialty gases, materials ,Gas supply system and Gas engineering to the semiconductor, LED, DRAM, TFT-LCD market, we can provide you with the necessary materials to launch your products to the cutting edge of the industry.
Our products (BCL3, N2O, C2F6, C4F8, C4F6, CHF3, SiH4, SF6, CF4, Neon, GeH4 and etc. ) satisfy the electronics industry's exacting standards for safety, quality, control, reliability and performance, and we offer a value-add portfolio of ultra-high-purity process gases, precursors and sputtering targets to meet your needs. And with state-of-the-art facilities in China mainland, Taiwan, India, and UK, we have the means to maintain a reliable product supply for our customers across the globe.
