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Halogen H2 CO N2 He Xe Mixture Gases 99.999% Gas Hydrogen Carbon Monoxide Nitrogen Helium Xenon Mixtures For Excimer laser
Halogen H2 CO N2 He Xe Mixture Gases 99.999% Gas Hydrogen Carbon Monoxide Nitrogen Helium Xenon Mixtures For Excimer laser

Halogen H2 CO N2 He Xe Mixture Gases 99.999% Gas Hydrogen Carbon Monoxide Nitrogen Helium Xenon Mixtures For Excimer laser

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Product Overview

Description


Product Description

H2/CO/N2/He/Xe

Hydrogen (H2),Carbon Monoxide (CO),Nitrogen(N2),Helium(He),Xenon (Xe) Mixtures are used in lithography applications, usually in conjunction with a halogen gas mixture.

\t
Major Components
\t
Components
\t
Concentration
\t
Xenon (Xe)
\t
available upon request.
\t
Carbon Monoxide (CO)
\t
available upon request.
\t
Hydrogen (H2)
\t
available upon request.
\t
Helium(He)
\t
available upon request.
\t
Nitrogen(N2)
\t
Balance
Product Spec
\t
Maximum Impurities
\t
COMPONENT
\t
CONCENTRATION (ppmv)
\t
Carbon Dioxide (CO2)
\t
<0.5
\t
Carbon Monoxide (CO)
\t
<0.5
\t
Carbon Tetrafluoride (CF4)
\t
<0.5
\t
Helium (He)
\t
<8.0
\t
Moisture (H2O)
\t
<0.5
\t
Nitrogen (N2)
\t
<1.0
\t
Oxygen (O2)
\t
<0.5
\t
THC (as Methane) (CH4)
\t
<0.5
\t
Xenon (Xe)
\t
<1.0
Packing & Delivery
\t
Cylinder Specifications*
\t
Contents
\t
Pressure
\t
Cylinder
\t
Valve Out Options
\t
Cubic Feet
\t
Liters
\t
PSIG
\t
BAR
\t
1
\t
CGA 580
\t
DISS 718
\t
265
\t
7500
\t
2000
\t
139
\t
2
\t
CGA 580
\t
DISS 718
\t
212
\t
6000
\t
2000
\t
139
\t
3
\t
CGA 580
\t
DISS 718
\t
71
\t
2000
\t
1800
\t
125
\t\t\t\t\t\t\t\t\tFAQ \t\t\t\t\t\t\t
\t\t\t\t\t\t\t\t\tWhy Choose Us \t\t\t\t\t\t\t
\t\t\t\t\t\t\t\t\tOur Company \t\t\t\t\t\t\t
Air Gas Electronic Materials Enterprise Co., Ltd is a manufacturer. Our head office was located in Taiwan. With over 20 years experience in the supply of industrial and specialty gases, materials ,Gas supply system and Gas engineering to the semiconductor, LED, DRAM, TFT-LCD market, we can provide you with the necessary materials to launch your products to the cutting edge of the industry.

Our products (BCL3, N2O, C2F6, C4F8, C4F6, CHF3, SiH4, SF6, CF4, Neon, GeH4 and etc. ) satisfy the electronics industry's exacting standards for safety, quality, control, reliability and performance, and we offer a value-add portfolio of ultra-high-purity process gases, precursors and sputtering targets to meet your needs. And with state-of-the-art facilities in China mainland, Taiwan, India, and UK, we have the means to maintain a reliable product supply for our customers across the globe.

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