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Gas-discharge ion sources for generating linear ion beams. Principle of operation - anode layer ion beam source. High uniformity of ion flux distribution along the source makes it the optimum choice for substrate treatment on a drum or a carousel.
Processes:
- sputtering of materials from dielectric and conductive targets;
- magnetron sputtering assistance;
- ion cleaning, etching;
- polishing;
- plasma-enhanced chemical vapor deposition (PECVD);
- surface modification.