Microstructure Substrate Ultra high Vacuum PVD Metal Magnetron Sputtering Coating Equipment

Features

· 4 magnetron sputtering guns for 4 different target materials

· Depending on the power supplies used (RF and DC), both metallic and non-metallic materials can be deposited. 

· Capable of sputtering 4 target materials to produce various compositions via different sputtering times / rates

· With 4 power supplies (2DC+1PulseDC+1RF), 4 target materials can be sputtered at the same time for combinatorial sputtering

Input Power

· Single phase 220 VAC, 50 / 60 Hz

· 1000 W (including vacuum pump and water chiller)

RF Power Supply

· One 13.56 MHz, 300 W auto-match RF generator is included and connected to the sputtering head

DC Power Supply

· Two 500W DC power supplies are included for metallic target sputtering

Pulse DC Power Supply

· One 1000 W pulse DC power supply is included.

· DC output power: 0 W ~ 1000 W continuously adjustable

· DC source voltage: 0 V to 800 V

· Maximum current: 2.0 A

· The power supply can support three modes of constant current, constant voltage and constant power.

· Frequency: 40K. The duty cycle is adjustable from 10% to 90%.

· Working pressure range: 0 Pa ~ 100 Pa.

· Continuous working time: 24 h.

· Data display mode: 105 mm × 40 mm LCD display

Magnetron Sputtering Head

· Four 2" magnetron sputtering heads are included and inserted into stainless steel chamber via quick clamps

· One 16 L/min digitally controlled recirculating water chiller is included for cooling sputtering head

Sputtering Target

· Target size requirement: 2" diameter x 1/8" thickness max.

· Sputtering distance range: 50 – 80 mm adjustable

· 2" diameter Cu targets are included for demo testing

· Various oxide 2" sputtering targets are available upon request at extra cost

Vacuum Chamber

· Vacuum chamber is made of 304 stainless steel with reinforcing rib 

· Vacuum chamber size:  1000 mm × 1000 mm × 800 mm

· 100 mm Dia. glass window.

· Temperature range: 25 to 150 °C

Sample Holder

· 185mm Dia. rotatable heating sample holder

· The sample holder temperature is adjustable from RT to 500 °C max. 

Vacuum Pump System

· KF40 vacuum port is built in for connecting to a vacuum pump.

· A two-stage rotary vane vacuum pump as backing pump is included.

· A 600L/s turbo molecular pump is included, ultimate vacuum: 6x10^-7 Pa

Film Thickness Monitoring System

· Resolution: +/- 0.03Hz (5-6MHz), 0.0136Ã

· Accuracy: +-/05% thickness

· Measurement speed: 100mS-1S adjustable

· Measurement range: 500 000Ã

· Standard sensor crystal: 6MHz

· Analog output: 8 bit resolution, PWM

· Monitor connects the computer to display or connect the display by software

Compliance

· CE approval   

Warranty 

· One years limited warranty with lifetime support