Fused Quartz
- Category: >>>
- Supplier: Lianyungang Hantian International Trade Co. Ltd
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Product Overview
Description
Fused Silica is formed by chemical combination of silicon and oxygen. Fused Silica is perfect optical material due to its good UV and IR transmission, low coefficient of thermal expansion. It has high stability and resistance to thermal shock over large temperature excursions, wide temperature operating range and high laser damage threshold.
| Parameter|Value | UV grade Fused Silica |
| Maximum Size | <Φ200mm |
| Transmission Range | 0.17~2.10um |
| (Medium transmission ratio) | (Tavg>90%) |
| OH- Content | 1200 ppm |
| Fluorescence (ex 254nm) | Virtually Free |
| Impurity Content | 5 ppm |
| Birefringence Constant | 2-4 nm/cm |
| Melting Method | Synthetic CVD |
| Applications | Laser substrate: Window, lens, prism, mirror... |
Size available
1. 4/10,10/20,20/50,30/50,50/100, 100F,120F,325F;
2. 0.0-0.5mm,0.5-1.0mm,1-3mm, 3-5mm,3-8mm,5-10mm;
3. Micropowder can be supplied as required
Fused Silica is an excellent raw material for use in investment casting, refractories, foundries, technical ceramics, and other applications that require a consistent, high purity product with very low thermal expansion.
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