Целевая фабрика высокочистый металл Ванадий V распылитель целевой Материал от производителя

      Vanadium Target Material, Vanadium: Element Symbol V, Silver-Gray Metal, Belongs To VB Group In The Periodic Table, Atomic Number 23, Atomic Weight 50.9414, Body-Centered Cubic Crystal, Common Valences Are +5, +4, +3, +2. Vanadium Has A Very High Melting Point And Is Often Referred To As Refractory Metal Together With Niobium, Tantalum, Tungsten, And Molybdenum. It Is Malleable, Hard And Non-Magnetic. It Has The Ability To Resist Hydrochloric Acid And Sulfuric Acid, And Has Better Resistance To Gas, Salt And Water Corrosion Than Most Stainless Steels. It Is Not Oxidized In The Air And Is Soluble In Hydrofluoric Acid, Nitric Acid And Aqua Regia. High-Purity Vanadium Has The Characteristics Of Hydrogen Storage, High-Temperature Superconductivity, Small Fast Neutron Absorption Cross-Section And Corrosion Resistance To Liquid Sodium. Therefore, High-Purity Metal Vanadium Targets Are Used For Hydrogen Storage Alloys And Hydrogen Separation Membranes, High-Temperature Superconducting Materials And High-Speed Value-Added Reactor Fuel Rod Protection Materials And Heat-Releasing Elements. The Following Figure Shows Two Typical Microscopic Metallographic Inspection Pictures Of Vanadium Sputtering Targets, With An Average Particle Size <100um .

As long as you provide detailed target information, such as purity, size, tolerance requirements, and other technical requirements, we will provide you with a quotation as soon as possible and provide the fastest delivery time.

      We Produce High-Purity Sputtering Targets. Its Most Important Advantage Is That In The Process Of Physical Vapor Deposition, A Thin Film With Excellent Conductivity And Particle Minimization Can Be Obtained. The Following Table Is A Certificate Of Composition Analysis Of 3N High-Purity Vanadium Sputtering Target. The Analytical Methods Used: 1. Use ICP-OES To Analyze Metal Elements; 2. Use LECO To Analyze Gas Elements.