Машина плазменной обработки/машина обработки поверхности/плазменная обработка
316 751,68-395 939,60 ₽
Вакуумная плазменная обработка поверхности/машина для вакуумной плазменной очистки/компактный плазменный пылесос
- Категория: >>>
- Поставщик: Guangzhou Minder-Hightech Co. ltd.Guangzhou ltd.
Сохранить в закладки 1600511154298:
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Характеристики
Vacuum plasma cleaning machine MD-SPV50 Technical Specification
（1）Product description
（1.1）The role of plasma cleaning
The principle of plasma cleaning is mainly：
（A）Etching on the surface of materials - physical effects
A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals,
act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also
produces an etching effect to roughen the surface of the sample. Many fine pits are formed, increasing the surface ratio
of the sample. Improve the wetting properties of solid surfaces.
（B）Activation bond energy, cross-linking
The energy of the particles in the plasma is between 0-20 eV, and most of the bonds in the polymer
are between 0-10 eV.
When a solid surface is used, the original chemical bond on the solid surface can be broken, and the
free radicals in the plasma and these bonds
The formation of a network of crosslinked structures greatly activates surface activity.
（C）Forming new functional groups - chemistry
If a reactive gas is introduced into the discharge gas, a complicated chemical reaction occurs on the
surface of the activated material, and new functional groups such as a hydrocarbon group, an amino
group, a carboxyl group, and the like are introduced, and these functional groups are all active groups,
which can significantly improve the surface activity of the material.
（1.1）The role of plasma cleaning
The principle of plasma cleaning is mainly：
（A）Etching on the surface of materials - physical effects
A large number of active particles in the plasma, such as a large number of ions, excited molecules, and free radicals,
act on the surface of the solid sample, which not only removes the original contaminants and impurities, but also
produces an etching effect to roughen the surface of the sample. Many fine pits are formed, increasing the surface ratio
of the sample. Improve the wetting properties of solid surfaces.
（B）Activation bond energy, cross-linking
The energy of the particles in the plasma is between 0-20 eV, and most of the bonds in the polymer
are between 0-10 eV.
When a solid surface is used, the original chemical bond on the solid surface can be broken, and the
free radicals in the plasma and these bonds
The formation of a network of crosslinked structures greatly activates surface activity.
（C）Forming new functional groups - chemistry
If a reactive gas is introduced into the discharge gas, a complicated chemical reaction occurs on the
surface of the activated material, and new functional groups such as a hydrocarbon group, an amino
group, a carboxyl group, and the like are introduced, and these functional groups are all active groups,
which can significantly improve the surface activity of the material.
（1.2）Advantages of vacuum plasma cleaning
Plasma cleaning is an important material surface modification method and has been widely used in
many fields.
And some traditional cleaning methods, such as ultrasonic cleaning, UV cleaning, etc., have the
following advantages：
（A）Low processing temperature
The processing temperature can be as low as 80 ° C - 50 ° C. Low processing temperatures ensure no
thermal effects on the sample surface.
（B）No pollution during the whole process
The plasma cleaner itself is a very environmentally friendly device that does not cause any
pollution，and does not cause any pollution during the treatment process.
（C）Stable processing effect
The treatment effect of plasma cleaning is very uniform and stable, and the effect of maintaining the
sample after a long period of time is good.
（D）Can handle samples of various shapes
For complex shaped samples, plasma cleaning can find the right solution.
Vacuum plasma cleaning allows for the cleaning of the internal position of the solid sample.
Plasma cleaning is an important material surface modification method and has been widely used in
many fields.
And some traditional cleaning methods, such as ultrasonic cleaning, UV cleaning, etc., have the
following advantages：
（A）Low processing temperature
The processing temperature can be as low as 80 ° C - 50 ° C. Low processing temperatures ensure no
thermal effects on the sample surface.
（B）No pollution during the whole process
The plasma cleaner itself is a very environmentally friendly device that does not cause any
pollution，and does not cause any pollution during the treatment process.
（C）Stable processing effect
The treatment effect of plasma cleaning is very uniform and stable, and the effect of maintaining the
sample after a long period of time is good.
（D）Can handle samples of various shapes
For complex shaped samples, plasma cleaning can find the right solution.
Vacuum plasma cleaning allows for the cleaning of the internal position of the solid sample.
（1.2）Product principle
The structure of the plasma cleaner is mainly divided into five major components: control system,
Excitation power system, vacuum chamber, process gas system, and vacuum pump system.
The structure of the plasma cleaner is mainly divided into five major components: control system,
Excitation power system, vacuum chamber, process gas system, and vacuum pump system.
（A）Control System：
The function of the control system is to control the operation of the entire device, including human-
machine interface (touch screen), PLC, electrical circuit. Vacuum plasma cleaning with fully
automatic control system enables multiple modes and multiple programs to control the cleaning
equipment to meet the needs of different customers.
（B）Excitation power system：
There are three main types of excitation power: 40KHz intermediate frequency excitation power
supply, 13.56MHz RF excitation power supply, and 2.45GHz microwave excitation power supply. At
present, the industry mainly uses RF excitation power supply and intermediate frequency excitation
power supply.For different applications.
（C）Vacuum chamber：
The vacuum chamber is mainly divided into three materials: 1) aluminum alloy cavity, 2) stainless
steel vacuum chamber, 3) quartz cavity. Different discharge modes and different sample sizes and
capacities can be achieved depending on the user's different needs.（D）Process gas system：
Process gases include flow meters, pneumatic valves, etc. Users can flexibly choose multiple process gas
solutions, argon, oxygen, hydrogen, nitrogen, carbon tetrafluoride, etc., to meet different process
requirements. Clean the surface of various products.
（E）Vacuum pump：
The vacuum pump is divided into an oil pump, a dry pump and a Roots pump. The oil pump mainly
adopts a two-stage rotary vane pump, and the vacuum pump is formulated according to the volume,
work efficiency and environmental requirements of the user.。
The function of the control system is to control the operation of the entire device, including human-
machine interface (touch screen), PLC, electrical circuit. Vacuum plasma cleaning with fully
automatic control system enables multiple modes and multiple programs to control the cleaning
equipment to meet the needs of different customers.
（B）Excitation power system：
There are three main types of excitation power: 40KHz intermediate frequency excitation power
supply, 13.56MHz RF excitation power supply, and 2.45GHz microwave excitation power supply. At
present, the industry mainly uses RF excitation power supply and intermediate frequency excitation
power supply.For different applications.
（C）Vacuum chamber：
The vacuum chamber is mainly divided into three materials: 1) aluminum alloy cavity, 2) stainless
steel vacuum chamber, 3) quartz cavity. Different discharge modes and different sample sizes and
capacities can be achieved depending on the user's different needs.（D）Process gas system：
Process gases include flow meters, pneumatic valves, etc. Users can flexibly choose multiple process gas
solutions, argon, oxygen, hydrogen, nitrogen, carbon tetrafluoride, etc., to meet different process
requirements. Clean the surface of various products.
（E）Vacuum pump：
The vacuum pump is divided into an oil pump, a dry pump and a Roots pump. The oil pump mainly
adopts a two-stage rotary vane pump, and the vacuum pump is formulated according to the volume,
work efficiency and environmental requirements of the user.。
Technical Parameters
Power Systems | Custom RF power supply:13.56MHz 0-600W(Adjustable) |
Fully automatic vacuum capacitor matcher | |
Vacuum system | Custom two-stage rotary vane pump(Oil pump):40m3/h |
Vacuum gauge: Japan Inficon Pirani vacuum gauge | |
Vacuum line: all stainless steel line high strength vacuum bellows | |
Cavity system (customizable) | Aluminum alloy material;Military grade welding 25mm thickness |
Cavity internal dimensions：375*375*425mm(W*H*D) | |
Electrode plate layout:Horizontal arrangement, extractable | |
Work tray | |
Space layer number:6 layers | |
Gas system | Pneumatic valve:Japan SMC |
Flow meter:China SevenStar:0-300SCCM | |
Two process gases:Argon, oxygen (Argon, oxygen, nitrogen, hydrogen, four nitrogen fluoride are optional.) | |
Control system | PLC:German SIEMENS S series |
Seven inch touchscreen: WEINVIEW | |
Electrical parts:Schneider | |
Other parameters | Dimensions:885*900*1576mm(W*H*D) |
Weight:350kg | |
Color:Silver |
Performance advantage
（3.1）Original imported power supply: It adopts imported high-voltage excitation power circuit
technology to produce high-density plasma to ensure superior cleaning effect.
（3.2）Comprehensive safety protection: temperature safety protection function, overload protection
function, short circuit breaking alarm protection function, various misoperation protection functions.
（3.3）Unique discharge technology: special treatment and special structure of the discharge device
to ensure a stable and uniform plasma.
（3.4）Excellent vacuum chamber design: military-grade high vacuum vacuum chamber design and
manufacturing process, equipped with imported vacuum pump.
（3.5）High-quality product parts: All parts of the products are made of top quality parts at home
and abroad to ensure superior equipment performance.
（3.6）Ultra-low cleaning temperature: meets the temperature requirements of different occasions,
and does not emerge the the temperature affect of the product.
（3.7）Precision CNC machining: imported precision CNC machine tool processing technology, and
equipped with imported three-coordinate measuring instrument for quality monitoring.
（3.8）Suitable for complex shape samples: cleaning all kinds of complex shapes, including the inner
wall of the inner hole, evenly cleaning in all directions
technology to produce high-density plasma to ensure superior cleaning effect.
（3.2）Comprehensive safety protection: temperature safety protection function, overload protection
function, short circuit breaking alarm protection function, various misoperation protection functions.
（3.3）Unique discharge technology: special treatment and special structure of the discharge device
to ensure a stable and uniform plasma.
（3.4）Excellent vacuum chamber design: military-grade high vacuum vacuum chamber design and
manufacturing process, equipped with imported vacuum pump.
（3.5）High-quality product parts: All parts of the products are made of top quality parts at home
and abroad to ensure superior equipment performance.
（3.6）Ultra-low cleaning temperature: meets the temperature requirements of different occasions,
and does not emerge the the temperature affect of the product.
（3.7）Precision CNC machining: imported precision CNC machine tool processing technology, and
equipped with imported three-coordinate measuring instrument for quality monitoring.
（3.8）Suitable for complex shape samples: cleaning all kinds of complex shapes, including the inner
wall of the inner hole, evenly cleaning in all directions
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