Disilane gas/Si2H6 gas/semiconductor gas

Product Overview

Description

Disilane and silane thermally decompose around 640 °C, depositing amorphous silicon. This chemical vapor deposition process is relevant to the manufacture of photovoltaic devices^. Specifically it is utilized in the production of silicon wafers.

 

Ammonia

Argon

Arsine

Boron Trichloride

Boron Trifluoride

Carbon Dioxide

Carbon Monoxide

Carbonyl Sulfide

Chlorine

Deuterium

Dichlorosilane

Disilane

Ethane

Ethylene

Germane

Halocarbon 116 (Hexafluoroethane)

Halocarbon 14 (Tetrafluoromethane)

Halocarbon 218 (Perfluoropropane)

Halocarbon 23 (Trifluoromethane)

Halocarbon 32 (Difluoromethane)

Halocarbon 41 (Methyl Fluoride)

Halocarbon 4110 (Octafluorocyclopentene)

Halocarbon C318 (Octafluorocyclobutane)